24 件のレコードが見つかりました。
Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)National Institute for Materials Science
- キーワード
- Ga2O3, lithography
- 刊行年月日
- 2023-01-01
- 更新時刻
- 2024-01-24 11:20:15 +0900
Atomic position and the chemical state of an active Sn dopant for Sn-doped β-Ga2O3(001)
- ジャーナル論文
- 著者
-
Yuhua Tsai (author) (この著者で検索)National Institute for Materials Science
;
Masaaki Kobata (author) (この著者で検索)
https://orcid.org/0000-0002-9710-6308
(unauthenticated)
;
Tatsuo Fukuda (author) (この著者で検索)
https://orcid.org/0000-0002-4832-5862
(unauthenticated)
;
Hajime Tanida (author) (この著者で検索)
https://orcid.org/0009-0002-8468-7315
(unauthenticated)
;
;Toru Kobayashi (author) (この著者で検索)Yoshiyuki Yamashita (author) (この著者で検索)National Institute for Materials Science
- キーワード
- Ga2O3, dopant, b-Ga2O3
- 刊行年月日
- 2024-03-11
- 更新時刻
- 2024-03-19 12:30:20 +0900
Plasma-free anisotropic selective-area etching of β-Ga 2 O 3 using forming gas under atmospheric pressure
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)
;
Rie Togashi (author) (この著者で検索)
https://orcid.org/0000-0002-9467-0755
(unauthenticated)
;
Yuichi Oshima (author) (この著者で検索)
- キーワード
- Ga2O3, forming gas, anisotropic etching, plasma-free process
- 刊行年月日
- 2024-12-31
- 更新時刻
- 2024-07-31 12:30:20 +0900
Using selective-area growth and selective-area etching on (−102) β-Ga2O3 substrates to fabricate plasma-damage-free vertical fins and trenches
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)National Institute for Materials Science Research Center for Electronic and Optical Materials
;
Yuichi Oshima (author) (この著者で検索)National Institute for Materials Science Research Center for Electronic and Optical Materials
- キーワード
- Ga2O3, (-102), selective area growth, selective area etching
- 刊行年月日
- 2024-01-22
- 更新時刻
- 2025-01-25 12:30:12 +0900
Fabrication of β -Ga 2 O 3 /air-gap structures on (010) β -Ga 2 O 3 by wet etching in tetramethylammonium hydroxide (TMAH)
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)
- キーワード
- Ga2O3, TMAH, wet etching, MEMS
- 刊行年月日
- 2025-11-01
- 更新時刻
- 2025-11-27 08:30:13 +0900
Step-and-terrace surface formation on (001) β-Ga2O3 by wet etching using 2.38 wt% tetramethylammonium hydroxide (TMAH) lithographic developer
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)
- キーワード
- Ga2O3, TMAH, Wet etching
- 刊行年月日
- 2025-08-01
- 更新時刻
- 2025-08-18 16:30:36 +0900
Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)National Institute for Materials Science
;
Yuichi Oshima (author) (この著者で検索)National Institute for Materials Science
- キーワード
- Ga2O3, HCl gas etching
- 刊行年月日
- 2023-06-01
- 更新時刻
- 2024-06-15 08:30:13 +0900
Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
- ジャーナル論文
- 著者
-
Takayoshi Oshima (author) (この著者で検索)National Institute for Materials Science
;
Yuichi Oshima (author) (この著者で検索)National Institute for Materials Science
- キーワード
- Ga2O3, selective area growth
- 刊行年月日
- 2022-07-01
- 更新時刻
- 2024-01-05 22:13:27 +0900