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TANUMA, Shigeo
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Auger Depth Profile Analysis of GaAs/AIAs Thin Film by Synthesized Spectrum Method Using Non-Negative Least Square Curve Fitting
Description/Abstract:
We have carried out the Auger depth profiling analysis of GaAs/AIAs multilayer structure using the peaks of GaMVV and A1LVV. Since the tw...
Keyword:
Auger depth profiling analysis
,
GaAs/AlAs multilayer
,
non-negative least-square curve fit
, and
peak separation
Material/Specimen:
GaAs/AlAs multilayer
Resource Type:
Article
Author:
OGIWARA, Toshiya
and
TANUMA, Shigeo
Journal:
Journal of The Surface Science Society of Japan
Date Uploaded:
01/10/2021
Date Modified:
01/10/2021
Depth Profiling Analysis of InP/GaInAsP Multilayer Structure with Auger Electron Spectroscopy by Using Argon Ion Spot Beam
Description/Abstract:
It is very difficult to obtained the Auger depth profile of InP multilayer structures with argon ion sputtering because the very large su...
Keyword:
Auger Depth Profiling Analysis
,
Argon Ion Spot Beam
, and
InP/GaInAsP Multilayer Specimen
Material/Specimen:
InP/GaInAsP Multilayer
Resource Type:
Article
Author:
OGIWARA, Toshiya
,
HARADA, Tomoko
, and
TANUMA, Shigeo
Journal:
Journal of The Surface Science Society of Japan
Date Uploaded:
01/10/2021
Date Modified:
01/10/2021
First-principles calculations of optical constants
Description/Abstract:
The energy loss function (ELF) describes the interaction between electrons and matter in solids. It is essential for understanding quanti...
Keyword:
compound semiconductor
,
energy loss function
,
first-principles calculation
, and
optical constant
Resource Type:
Dataset
Data origin:
simulations
Author:
SHINOTSUKA, Hiroshi
,
YOSHIKAWA, Hideki
, and
TANUMA, Shigeo
Journal:
e-Journal of Surface Science and Nanotechnology
Date Uploaded:
18/01/2021
Date Modified:
07/07/2021
Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 — Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy —Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
Description/Abstract:
ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative ana...
Keyword:
AES
,
Auger electron spectroscopy
,
ISO
,
International Organization for Standardization
,
X-ray photoelectron spectroscopy
,
XPS
,
quantitative surface analysis
, and
relative sensitivity factor
Resource Type:
Article
Author:
TANUMA, Shigeo
Journal:
Surface and Interface Analysis
Date Uploaded:
08/10/2020
Date Modified:
01/07/2021
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IMFP
5
Auger depth profiling analysis
3
EPES
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Fano Plot
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InP/GaInAsP multilayer specimens
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Language
English
8
Japanese
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National Institute for Materials Science
5
Surface Science Society of Japan
4
Wiley
2
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7
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open
14
Rights Statement Sim
Creative Commons BY-NC Attribution-NonCommercial 4.0 International
7
In Copyright
5
Creative Commons BY Attribution 4.0 International
1
Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International
1
Computational methods
density functional theory or electronic structure
1
Data origin
simulations
1
Properties addressed
electrical -- dielectric constant and spectra
1
optical
1
Material/Specimen
InP/GaInAsP multilayer specimens
2
GaAs/AlAs multilayer
1
InP/GaInAsP Multilayer
1
Date created
2021
1
Author
TANUMA, Shigeo
14
OGIWARA, Toshiya
4
C.J. Powell
2
SHINOTSUKA, Hiroshi
2
YOSHIKAWA, Hideki
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1
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Journal of The Surface Science Society of Japan
4
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
1
SURFACE AND INTERFACE ANALYSIS
1
Surface and Interface Analysis
1
e-Journal of Surface Science and Nanotechnology
1