File type: application/pdf Keyword: atomic layer deposition
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Nabatame_d-SiO2-Ga2O3 2026_ECS_J._Solid_State_Sci._Technol._15_064005.pdf
Characteristics of β-Ga2O3/Al2O3/Pt capacitors with a Ga2O3 surface modified using the dummy-SiO2 process
Journal article
Creator
Toshihide Nabatame (author) (Search by this author)
Research Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science
ORCID SAMURAI ;
Yoshihiro Irokawa (author) (Search by this author)
Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science
ORCID SAMURAI ;
Tomomi Sawada (author) (Search by this author)
Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science
;
Hiromi Miura (author) (Search by this author)
Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science
;
Manami Miyamoto (author) (Search by this author)
Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science
;
Takashi Onaya (author) (Search by this author)
Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science
ORCID ;
Yasuo Koide (author) (Search by this author)
Research Center for Electronic and Optical Materials/Functional Materials Field/Next-generation Semiconductor Group, National Institute for Materials Science
ORCID SAMURAI ;
Kazuhito Tsukagoshi (author) (Search by this author)
Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science
ORCID SAMURAI
Keyword
Ga2O3, atomic layer deposition, dummy-SiO2, Al2O3, positive bias stress
Date published
2026-06-01
Updated at
2026-08-18 11:30:17 +0900
T. Onaya and T. Nabatame, Jpn. J. Appl. Phys. 65, 080804 (2026)..pdf
Interface engineering of HfO 2 -based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO 2 nucleation layers
Journal article
Creator
Takashi Onaya (author) (Search by this author)
National Institute for Materials Science
ORCID ;
Toshihide Nabatame (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI
Keyword
atomic layer deposition, ferroelectric HfO2-based thin films, memory devices, interface engineering, crystal phase control
Date published
2026-04-30
Updated at
2026-07-13 17:01:06 +0900
H. Che et al., J. Vac. Sci. Technol. A 44, 030402 (2026).pdf
Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
Journal article
Creator
Haoming Che (author) (Search by this author)
;
Takashi Onaya (author) (Search by this author)
National Institute for Materials Science
ORCID ;
Atsushi Tamura (author) (Search by this author)
;
Masaki Ishii (author) (Search by this author)
;
Hiroshi Taka (author) (Search by this author)
;
Koji Kita (author) (Search by this author)
Keyword
atomic layer deposition, ferroelectric HfO2-based thin films, oxidant, low temperature fabrication process
Date published
2026-05-01
Updated at
2026-07-14 10:27:45 +0900
Adv Funct Materials - 2025 - Byloff - From Mechanics to Electronics Influence of ALD Interlayers on the Multiaxial.pdf
From Mechanics to Electronics: Influence of ALD Interlayers on the Multiaxial Electro‐Mechanical Behavior of Metal–Oxide Bilayers
Journal article
Creator
Johanna Byloff (author) (Search by this author)
ORCID ;
Vivek Devulapalli (author) (Search by this author)
ORCID ;
Daniele Casari (author) (Search by this author)
ORCID ; ORCID SAMURAI ;
Claus O. W. Trost (author) (Search by this author)
ORCID ;
Megan J. Cordill (author) (Search by this author)
ORCID ;
Shuhel Altaf Husain (author) (Search by this author)
ORCID ;
Pierre‐Olivier Renault (author) (Search by this author)
ORCID ;
Damien Faurie (author) (Search by this author)
ORCID ;
Barbara Putz (author) (Search by this author)
ORCID
Keyword
atomic layer deposition, electromechanical properties, flexible polymer substrates, tensile testing, thin films
Date published
2025-11-27
Updated at
2026-01-20 11:54:44 +0900
ALD_Interlayers_for_robust_metal-polymer_interfaces_supporting-info.pdf
Atomic Layer-Deposited Interlayers for Robust Metal–Polymer Interfaces
Journal article
Creator
Johanna Byloff (author) (Search by this author)
ORCID ;
Claus Othmar Wolfgang Trost (author) (Search by this author)
ORCID ;
Vivek Devulapalli (author) (Search by this author)
;
Shuhel Altaf Husain (author) (Search by this author)
;
Damien Faurie (author) (Search by this author)
ORCID ;
Pierre-Olivier Renault (author) (Search by this author)
; ORCID SAMURAI ;
Megan J. Cordill (author) (Search by this author)
ORCID ;
Daniele Casari (author) (Search by this author)
ORCID ;
Barbara Putz (author) (Search by this author)
Keyword
thin films, electromechanical properties, atomic layer deposition, flexible substrates, tensile testing, adhesion
Date published
2025-07-16
Updated at
2025-08-22 09:46:25 +0900
ChemMater36_6139_2024.pdf
Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films
Journal article
Creator
Tohru Tsuruoka (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI ;
Samapika Mallik (author) (Search by this author)
ORCID ;
Takuji Tsujita (author) (Search by this author)
;
Yuu Inatomi (author) (Search by this author)
;
Kazuya Terabe (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI
Keyword
atomic layer deposition, lithium phosphate, lithium phosphorus oxynitride, solid-state electrolyte, plasma reactant
Date published
2024-06-25
Updated at
2025-06-25 08:30:22 +0900
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