論文 Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films

Tohru Tsuruoka SAMURAI ORCID (National Institute for Materials ScienceROR) ; Samapika Mallik ORCID ; Takuji Tsujita ; Yuu Inatomi ; Kazuya Terabe SAMURAI ORCID (National Institute for Materials ScienceROR)

コレクション

引用
Tohru Tsuruoka, Samapika Mallik, Takuji Tsujita, Yuu Inatomi, Kazuya Terabe. Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films. Chemistry of Materials. 2024, 36 (12), 6193-6204. https://doi.org/10.1021/acs.chemmater.4c00960
SAMURAI

説明:

(abstract)

The effects of plasma reactants on the plasma-assisted atomic layer deposition (ALD) of lithium phosphate were investigated in relation to the fabrication of high-quality lithium phosphorus oxynitride (LiPON) thin films for the potential use as a solid-state electrolyte (SSE) in both microbatteries and neuromorphic devices. Our ALD processes enable the incorporation of nitrogen into a lithium phosphate matrix, using lithium tert-butoxide and tris(dimethylamino)phosphine as the lithium and phosphorus precursors, respectively, in a deposition temperature window of 220-300 °C. With O2 plasma, polycrystalline lithium phosphate films, with a relatively well-arranged pyrophosphate, are deposited. Amorphous LiPON films, with a mixture of pyrophosphates and orthophosphate, are obtained when Ar or NH3 plasma is used. When the NH3 flow rate increases, the nitrogen composition increases up to ~13%, while residual carbon is kept to below a few percent. For a Li2.5PO1.9N0.8 film deposited at 300 °C with NH3 plasma, the ionic conductivity is measured as 1.65 ± 0.42 × 10-6 S/cm at 25 °C, with an activation energy of 0.66 eV. This conductivity is the highest value of any ALD LiPON film reported to date. Our ALD processes exhibit a high level of controllability of the molecular structures of the phosphorus oxynitride matrix, with high ionic conductivity, which makes them suitable for realizing high-performance Li SSE thin films.

権利情報:

  • In Copyright

    This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, copyright © 2024 American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acs.chemmater.4c00960

キーワード: atomic layer deposition, lithium phosphate, lithium phosphorus oxynitride, solid-state electrolyte, plasma reactant

刊行年月日: 2024-06-25

出版者: American Chemical Society (ACS)

掲載誌:

  • Chemistry of Materials (ISSN: 08974756) vol. 36 issue. 12 p. 6193-6204

研究助成金:

  • Ministry of Education, Culture, Sports, Science and Technology JPMXP1223NM5065
  • Japan Society for the Promotion of Science 21H03412

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.4556

公開URL: https://doi.org/10.1021/acs.chemmater.4c00960

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更新時刻: 2025-06-25 08:30:22 +0900

MDRでの公開時刻: 2025-06-25 08:22:56 +0900

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