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Ogiwara, Toshiya
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Ultra High Depth Resolution Auger Depth Profiling by Both Electron and Ion Beams at the Glancing Incidence using an Inclined Specimen Holder
Description/Abstract:
We developed a 85°-high-angle inclined specimen holder which enabled the specimen surface to be irradiated by both electron and ion beams...
Keyword:
Auger Depth Profiling Analysis
,
Inclined Holder
,
GaAs/AlAs Superlattice
, and
Si/Ge multiple delta-doped layers
Material/Specimen:
GaAs/AlAs Superlattice and Si/Ge multiple delta-doped layers
Resource Type:
Article
Author:
Ogiwara, Toshiya
,
Nagatomi, Takaharu
,
Kim, Kyung Joong
, and
Tanuma, Shigeo
Journal:
Journal of The Surface Science Society of Japan
Date Uploaded:
08/09/2021
Date Modified:
08/09/2021
試料冷却法を併用したAES深さ方向分析によるSiO2/Si熱酸化膜の分析
Description/Abstract:
試料冷却法を併用したAES深さ方向分析によるSiO2/Si熱酸化膜の分析について検討を行った.分析時の試料保持温度を常温および-190℃として,それぞれの温度について電子線電流密度を3段階に変えてデプスプロファイルを取得した.イオン加速電圧は3kVである.また,測定したオー...
Keyword:
Auger Depth Profiling Analysis
,
Sample Cooling Method
, and
SiO2/Si
Material/Specimen:
SiO2:103nm/Si-Substrate
Resource Type:
Article
Author:
Ogiwara, Toshiya
and
Tanuma, Shigeo
Journal:
Journal of Surface Analysis
Date Uploaded:
26/07/2021
Date Modified:
26/07/2021
High-Sensitivity and High-Depth Resolution Auger Depth Profiling Using an Inclined Holder based on Geometric Characteristics of Auger Electron Spectroscopy Apparatus Equipped with Concentric Hemispherical Analyzer
Description/Abstract:
半球型電子分光器を搭載したオージェ電子分光装置では,傾斜ホルダーを用いると装置のジオ メトリー特性との関係からイオン及び一次電子の入射角の自由度が大きくなる.特に試料回転の 回転軸が一次電子の入射方向と一致する場合は,傾斜ホルダーの回転角によってイオン入射角を 設定でき,電...
Keyword:
Auger Depth Profiling Analysis
,
Inclined Holder
,
GaAs/AlAs Superlattice
, and
Si/Ge multiple delta-doped layers
Material/Specimen:
GaAs/AlAs Superlattice
and
Si/Ge multiple delta-doped layers
Resource Type:
Article
Author:
Ogiwara, Toshiya
,
Nagatomi, Takaharu
,
Kim, Kyung Joong
, and
Tanuma, Shigeo
Journal:
Journal of Surface Analysis
Date Uploaded:
14/06/2021
Date Modified:
18/06/2021
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Surface Analysis Society of Japan
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GaAs/AlAs Superlattice
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GaAs/AlAs Superlattice and Si/Ge multiple delta-doped layers
1
Si/Ge multiple delta-doped layers
1
SiO2:103nm/Si-Substrate
1
Author
Ogiwara, Toshiya
[remove]
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Tanuma, Shigeo
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Kim, Kyung Joong
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Nagatomi, Takaharu
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