HCl-gas etching of (001) β-Ga2O3 under oxygen supply

ジャーナル論文

著者

Yuichi Oshima (author) (この著者で検索)

https://orcid.org/0000-0001-8293-4891

National Institute for Materials Science Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group

NIMS Researchers Directory SAMURAI

Yuichi Oshima ;

Takayoshi Oshima (author) (この著者で検索)

https://orcid.org/0000-0001-8550-9735

National Institute for Materials Science Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group

NIMS Researchers Directory SAMURAI

Takayoshi Oshima

キーワード

Ga2O3, etching, plasma-free

刊行年月日

2025-12-31

更新時刻

2025-09-04 12:30:19 +0900