Plasma-free anisotropic selective-area etching of β-Ga ₂ O ₃ using forming gas under atmospheric pressure

論文

著者

Takayoshi Oshima ; Rie Togashi ; Yuichi Oshima

キーワード

Ga2O3, forming gas, anisotropic etching, plasma-free process

刊行年月日

2024-12-31

更新時刻

2024-07-31 12:30:20 +0900