Keyword: etching
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HCl-gas etching behavior of 001 -Ga2O3 under oxygen supply.pdf
HCl-gas etching of (001) β-Ga2O3 under oxygen supply
Journal article
Creator
Yuichi Oshima (author) (Search by this author)
Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science
ORCID SAMURAI ;
Takayoshi Oshima (author) (Search by this author)
Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science
ORCID SAMURAI
Keyword
Ga2O3, etching, plasma-free
Date published
2025-12-31
Updated at
2025-09-04 12:30:19 +0900
BGO(001)etch230802_clean.pdf
Effect of temperature and HCl partial pressure on the selective area gas etching of (001) β-Ga2O3
Journal article
Creator
Yuichi Oshima (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI ;
Takayoshi Oshima (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI
Keyword
β-Ga2O3, etching
Date published
2023-08-01
Updated at
2024-08-21 08:30:30 +0900
162102_1_5.0138736.pdf
Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
Journal article
Creator
Takayoshi Oshima (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI ;
Yuichi Oshima (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI
Keyword
Ga2O3, etching, HCl
Date published
2023-04-17
Updated at
2024-05-29 08:30:12 +0900
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