Atomic Layer-Deposited Interlayers for Robust Metal–Polymer Interfaces
- Journal article
- Creator
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Johanna Byloff (author) (Search by this author)
https://orcid.org/0000-0001-6026-6845
(unauthenticated)
;
Claus Othmar Wolfgang Trost (author) (Search by this author)
https://orcid.org/0000-0002-7570-688X
(unauthenticated)
;
;Vivek Devulapalli (author) (Search by this author);Shuhel Altaf Husain (author) (Search by this author)Damien Faurie (author) (Search by this author)
https://orcid.org/0000-0001-7259-3958
(unauthenticated)
;
;Pierre-Olivier Renault (author) (Search by this author)Thomas Edward James Edwards (author) (Search by this author)
;
Megan J. Cordill (author) (Search by this author)
https://orcid.org/0000-0003-1142-8312
(unauthenticated)
;
Daniele Casari (author) (Search by this author)
https://orcid.org/0000-0003-2113-5070
(unauthenticated)
;
Barbara Putz (author) (Search by this author) - Keyword
- thin films, electromechanical properties, atomic layer deposition, flexible substrates, tensile testing, adhesion
- Date published
- 2025-07-16
- Updated at
- 2025-08-22 09:46:25 +0900
From Mechanics to Electronics: Influence of ALD Interlayers on the Multiaxial Electro‐Mechanical Behavior of Metal–Oxide Bilayers
- Journal article
- Creator
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Johanna Byloff (author) (Search by this author)
https://orcid.org/0000-0001-6026-6845
(unauthenticated)
;
Vivek Devulapalli (author) (Search by this author)
https://orcid.org/0000-0002-1743-3246
(unauthenticated)
;
Daniele Casari (author) (Search by this author)
https://orcid.org/0000-0003-2113-5070
(unauthenticated)
;
Thomas E. J. Edwards (author) (Search by this author)
;
Claus O. W. Trost (author) (Search by this author)
https://orcid.org/0000-0002-7570-688X
(unauthenticated)
;
Megan J. Cordill (author) (Search by this author)
https://orcid.org/0000-0003-1142-8312
(unauthenticated)
;
Shuhel Altaf Husain (author) (Search by this author)
https://orcid.org/0000-0002-1080-565X
(unauthenticated)
;
Pierre‐Olivier Renault (author) (Search by this author)
https://orcid.org/0000-0002-0736-2333
(unauthenticated)
;
Damien Faurie (author) (Search by this author)
https://orcid.org/0000-0001-7259-3958
(unauthenticated)
;
Barbara Putz (author) (Search by this author)
https://orcid.org/0000-0001-9687-6346
(unauthenticated)
- Keyword
- atomic layer deposition, electromechanical properties, flexible polymer substrates, tensile testing, thin films
- Date published
- 2025-11-27
- Updated at
- 2026-01-20 11:54:44 +0900
Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films
- Journal article
- Creator
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Tohru Tsuruoka (author) (Search by this author)National Institute for Materials Science
;
Samapika Mallik (author) (Search by this author)
https://orcid.org/0000-0001-9281-9416
(unauthenticated)
;
;Takuji Tsujita (author) (Search by this author);Yuu Inatomi (author) (Search by this author)Kazuya Terabe (author) (Search by this author)National Institute for Materials Science
- Keyword
- atomic layer deposition, lithium phosphate, lithium phosphorus oxynitride, solid-state electrolyte, plasma reactant
- Date published
- 2024-06-25
- Updated at
- 2025-06-25 08:30:22 +0900
Interface engineering of HfO 2 -based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO 2 nucleation layers
- Journal article
- Creator
-
Takashi Onaya (author) (Search by this author)
https://orcid.org/0000-0002-2710-8623
(unauthenticated)
National Institute for Materials Science
;
Toshihide Nabatame (author) (Search by this author)National Institute for Materials Science
- Keyword
- atomic layer deposition, ferroelectric HfO2-based thin films, memory devices, interface engineering, crystal phase control
- Date published
- 2026-04-30
- Updated at
- 2026-07-13 17:01:06 +0900
Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
- Journal article
- Creator
-
;Haoming Che (author) (Search by this author)Takashi Onaya (author) (Search by this author)
https://orcid.org/0000-0002-2710-8623
(unauthenticated)
National Institute for Materials Science
;
;Atsushi Tamura (author) (Search by this author);Masaki Ishii (author) (Search by this author);Hiroshi Taka (author) (Search by this author)Koji Kita (author) (Search by this author)
- Keyword
- atomic layer deposition, ferroelectric HfO2-based thin films, oxidant, low temperature fabrication process
- Date published
- 2026-05-01
- Updated at
- 2026-07-14 10:27:45 +0900