Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas

ジャーナル論文

著者

Takayoshi Oshima (author) (この著者で検索)

https://orcid.org/0000-0001-8550-9735

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Takayoshi Oshima ;

Yuichi Oshima (author) (この著者で検索)

https://orcid.org/0000-0001-8293-4891

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Yuichi Oshima

キーワード

Ga2O3, etching, HCl

刊行年月日

2023-04-17

更新時刻

2024-05-29 08:30:12 +0900