ファイル種別: application/pdf キーワード: atomic layer deposition
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4 件のレコードが見つかりました。 1件目から4件目まで表示します。

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Nabatame_d-SiO2-Ga2O3 2026_ECS_J._Solid_State_Sci._Technol._15_064005.pdf
Characteristics of β-Ga2O3/Al2O3/Pt capacitors with a Ga2O3 surface modified using the dummy-SiO2 process
ジャーナル論文
著者
Toshihide Nabatame (author) (この著者で検索)
National Institute for Materials Science Research Center for Materials Nanoarchitectonics (MANA)
ORCID SAMURAI ;
Yoshihiro Irokawa (author) (この著者で検索)
National Institute for Materials Science Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group
ORCID SAMURAI ;
Tomomi Sawada (author) (この著者で検索)
National Institute for Materials Science Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group
;
Hiromi Miura (author) (この著者で検索)
National Institute for Materials Science Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group
;
Manami Miyamoto (author) (この著者で検索)
National Institute for Materials Science Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group
;
Takashi Onaya (author) (この著者で検索)
National Institute for Materials Science Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group
ORCID ;
Yasuo Koide (author) (この著者で検索)
National Institute for Materials Science Research Center for Electronic and Optical Materials/Functional Materials Field/Next-generation Semiconductor Group
ORCID SAMURAI ;
Kazuhito Tsukagoshi (author) (この著者で検索)
National Institute for Materials Science Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group
ORCID SAMURAI
キーワード
Ga2O3, atomic layer deposition, dummy-SiO2, Al2O3, positive bias stress
刊行年月日
2026-06-01
更新時刻
2026-08-18 11:30:17 +0900
H. Che et al., J. Vac. Sci. Technol. A 44, 030402 (2026).pdf
Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
ジャーナル論文
著者
Haoming Che (author) (この著者で検索)
;
Takashi Onaya (author) (この著者で検索)
National Institute for Materials Science
ORCID ;
Atsushi Tamura (author) (この著者で検索)
;
Masaki Ishii (author) (この著者で検索)
;
Hiroshi Taka (author) (この著者で検索)
;
Koji Kita (author) (この著者で検索)
キーワード
atomic layer deposition, ferroelectric HfO2-based thin films, oxidant, low temperature fabrication process
刊行年月日
2026-05-01
更新時刻
2026-07-14 10:27:45 +0900
T. Onaya and T. Nabatame, Jpn. J. Appl. Phys. 65, 080804 (2026)..pdf
Interface engineering of HfO 2 -based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO 2 nucleation layers
ジャーナル論文
著者
Takashi Onaya (author) (この著者で検索)
National Institute for Materials Science
ORCID ;
Toshihide Nabatame (author) (この著者で検索)
National Institute for Materials Science
ORCID SAMURAI
キーワード
atomic layer deposition, ferroelectric HfO2-based thin films, memory devices, interface engineering, crystal phase control
刊行年月日
2026-04-30
更新時刻
2026-07-13 17:01:06 +0900
ChemMater36_6139_2024.pdf
Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films
ジャーナル論文
著者
Tohru Tsuruoka (author) (この著者で検索)
National Institute for Materials Science
ORCID SAMURAI ;
Samapika Mallik (author) (この著者で検索)
ORCID ;
Takuji Tsujita (author) (この著者で検索)
;
Yuu Inatomi (author) (この著者で検索)
;
Kazuya Terabe (author) (この著者で検索)
National Institute for Materials Science
ORCID SAMURAI
キーワード
atomic layer deposition, lithium phosphate, lithium phosphorus oxynitride, solid-state electrolyte, plasma reactant
刊行年月日
2024-06-25
更新時刻
2025-06-25 08:30:22 +0900
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