- Creative Commons BY Attribution 4.0 International (500)
- In Copyright (233)
- Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International (121)
- Creative Commons BY-NC Attribution-NonCommercial 4.0 International (47)
- cc-by-3.0 (19)
- cc-by-nc-3.0 (6)
- https://creativecommons.org/licenses/by-nc/3.0/legalcode (3)
- https://creativecommons.org/licenses/by-nc/3.0/ (2)
- http://arxiv.org/licenses/nonexclusive-distrib/1.0/ (1)
- https://creativecommons.org/licenses/by-nc-nd/3.0/ (1)
957 records found. Displaying records 1 to 10.
試料冷却法を併用したAES深さ方向分析によるSiO2/Si熱酸化膜の分析
- Journal article
- Creator
-
Ogiwara, Toshiya (author) (Search by this author)
;
Tanuma, Shigeo (author) (Search by this author)
- Keyword
- Auger Depth Profiling Analysis, SiO2/Si, Sample Cooling Method
- Date published
- 1996-02-08
- Updated at
- 2022-10-03 01:39:59 +0900
Water Electrolysis Using a Porous IrO2/Ti/IrO2 Catalyst Electrode and Nafion Membranes at Elevated Temperatures
- Journal article
- Creator
-
Je-Deok Kim (author) (Search by this author)National Institute for Materials Science
;
Akihiro Ohira (author) (Search by this author)
- Keyword
- polymer electrolyte, nafion membrane, porous IrO2/Ti/IrO2 catalyst electrode, water electrolysis, elevated temperature
- Date published
- 2021-04-30
- Updated at
- 2024-01-05 22:12:20 +0900
Tunable Photodetectors via In Situ Thermal Conversion of TiS3 to TiO2
- Journal article
- Creator
-
;Foad Ghasemi (author) (Search by this author);Riccardo Frisenda (author) (Search by this author);Eduardo Flores (author) (Search by this author);Nikos Papadopoulos (author) (Search by this author);Robert Biele (author) (Search by this author);David Perez de Lara (author) (Search by this author);Herre S. J. van der Zant (author) (Search by this author)Kenji Watanabe (author) (Search by this author)National Institute for Materials Science
;
Takashi Taniguchi (author) (Search by this author)National Institute for Materials Science
;
;Roberto D’Agosta (author) (Search by this author);Jose R. Ares (author) (Search by this author);Carlos Sánchez (author) (Search by this author);Isabel J. Ferrer (author) (Search by this author)Andres Castellanos-Gomez (author) (Search by this author)
- Keyword
- Controlled oxidation, titanium trisulfide, band structure
- Date published
- 2020-04-09
- Updated at
- 2025-02-26 16:30:19 +0900
深冷分離法を用いたCO2/N2分離のプロセスシミュレーション
- Conference poster
- Creator
-
井上 瑞基 (author) (Search by this author)高分子・バイオ材料研究センター/高分子材料分野/高分子プロセス技術チーム, 物質・材料研究機構
;
ビン イスマイル イドゥアン (author) (Search by this author)高分子・バイオ材料研究センター/高分子材料分野/高分子プロセス技術チーム, 物質・材料研究機構
;
;田畑 卓哉 (author) (Search by this author)高分子・バイオ材料研究センター/高分子材料分野/高分子プロセス技術チーム, 物質・材料研究機構;工藤 友佑 (author) (Search by this author)プラントデジタルエックス株式会社一ノ瀬 泉 (author) (Search by this author)高分子・バイオ材料研究センター/高分子材料分野/高分子プロセス技術チーム, 物質・材料研究機構
- Keyword
- CO2/N2 separation, cryogenic separation, process simulation
- Date published
- Updated at
- 2025-12-23 10:17:52 +0900
Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam
- Journal article
- Creator
-
Yoshikawa, Hideki (author) (Search by this author)
;
Ogiwara, Toshiya (author) (Search by this author)
;
Nagata, Takahiro (author) (Search by this author)
- Keyword
- Auger Depth Profiling analysis, HfO2/Si, Ultra Low Angle Incidence Ion Beam
- Date published
- 2019-03-07
- Updated at
- 2024-01-05 22:11:28 +0900
Redox-based ion-gating reservoir consisting of (104) oriented LiCoO2 film, assisted by physical masking
- Journal article
- Creator
-
Kaoru Shibata (author) (Search by this author)National Institute for Materials Science
;
Daiki Nishioka (author) (Search by this author)National Institute for Materials Science
;
Wataru Namiki (author) (Search by this author)National Institute for Materials Science
;
Takashi Tsuchiya (author) (Search by this author)National Institute for Materials Science
;
;Tohru Higuchi (author) (Search by this author)Kazuya Terabe (author) (Search by this author)National Institute for Materials Science
- Keyword
- reservoir computing, ionics, redox transistor, ion-gating reservoir, neuromorphic computing
- Date published
- 2023-11-29
- Updated at
- 2024-12-12 16:30:42 +0900
Raw data files for Fig. 12 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- Dataset
- Creator
-
OGIWARA, Toshiya (author) (Search by this author)National Institute for Materials Science
;
NAGATA, Takahiro (author) (Search by this author)National Institute for Materials Science
;
YOSHIKAWA, Hideki (author) (Search by this author)National Institute for Materials Science
- Keyword
- Auger depth profiling analysis, HfO2/Si, Ultra low angle incidence ion beam
- Date published
- 2019-03-07
- Updated at
- 2024-01-05 22:13:20 +0900
Raw data files for Fig. 11 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- Dataset
- Creator
-
OGIWARA, Toshiya (author) (Search by this author)National Institute for Materials Science
;
NAGATA, Takahiro (author) (Search by this author)National Institute for Materials Science
;
YOSHIKAWA, Hideki (author) (Search by this author)National Institute for Materials Science
- Keyword
- Auger depth profiling analysis, HfO2/Si, Ultra low angle incidence ion beam
- Date published
- 2019-03-07
- Updated at
- 2024-04-07 22:57:41 +0900
Raw data files for Fig. 10 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- Dataset
- Creator
-
OGIWARA, Toshiya (author) (Search by this author)National Institute for Materials Science
;
NAGATA, Takahiro (author) (Search by this author)National Institute for Materials Science
;
YOSHIKAWA, Hideki (author) (Search by this author)National Institute for Materials Science
- Keyword
- Auger depth profiling analysis, HfO2/Si, Ultra low angle incidence ion beam
- Date published
- 2019-03-07
- Updated at
- 2024-01-05 22:12:41 +0900
Raw data files for Fig. 9 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- Dataset
- Creator
-
OGIWARA, Toshiya (author) (Search by this author)National Institute for Materials Science
;
NAGATA, Takahiro (author) (Search by this author)National Institute for Materials Science
;
YOSHIKAWA, Hideki (author) (Search by this author)National Institute for Materials Science
- Keyword
- Auger depth profiling analysis, HfO2/Si, Ultra low angle incidence ion beam
- Date published
- 2019-03-07
- Updated at
- 2024-10-08 12:20:27 +0900