- AES (2)
- Auger electron spectroscopy (2)
- ISO (1)
- International Organization for Standardization (1)
- X-ray photoelectron spectroscopy (1)
- XPS (1)
- electron backscattering correction (1)
- predictive formula for back scattering correction (1)
- quantitative surface analysis (1)
- relative sensitivity factor (1)
2 records found.
オージェ電子分光法における背面散乱補正 I．広い分析条件で使用可能な電子の背面散乱補正式の開発
- Journal article
- Creator
-
田沼 繁夫 (author) (Search by this author)
- Keyword
- Auger electron spectroscopy, AES, electron backscattering correction, predictive formula for back scattering correction
- Date published
- 2018-10-19
- Updated at
- 2024-01-05 22:13:01 +0900
Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 — Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy —Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
- Journal article
- Creator
-
TANUMA, Shigeo (author) (Search by this author)
- Keyword
- XPS, quantitative surface analysis, X-ray photoelectron spectroscopy, Auger electron spectroscopy, relative sensitivity factor, ISO, International Organization for Standardization, AES
- Date published
- 2005-12-28
- Updated at
- 2024-01-05 22:11:34 +0900