試料冷却法を併用したAES深さ方向分析によるSiO2/Si熱酸化膜の分析

Journal article

Creator

Ogiwara, Toshiya (author) (Search by this author)

https://orcid.org/0000-0002-7376-6571

NIMS Researchers Directory SAMURAI

Ogiwara, Toshiya ;

Tanuma, Shigeo (author) (Search by this author)

https://orcid.org/0000-0003-2628-9941

NIMS Researchers Directory SAMURAI

Tanuma, Shigeo

Keyword

Auger Depth Profiling Analysis, SiO2/Si, Sample Cooling Method

Date published

1996-02-08

Updated at

2022-10-03 01:39:59 +0900