Jun Uzuhashi
;
Yoshihiro Irokawa
;
Toshihide Nabatame
;
Tadakatsu Ohkubo
;
Yasuo Koide
Description:
(abstract)We previously reported that a dummy-SiO2 process improved the dielectric/GaN interface properties [Y. Irokawa et al., ECS J. Solid State Sci. Technol. 13, 085003 (2024)]; however, the improvement mechanism has remained unclear. In this study, the atomic-scale structural changes at Al2O3/GaN interfaces prepared with the dummy-SiO2 process are investigated through aberration-corrected scanning transmission electron microscopy with energy-dispersive X-ray spectroscopy. The results reveal that disordered GaN(O) polarity in the interfacial layer in a sample prepared by the standard process was restored to some extent after the dummy-SiO2 process, which likely led to the improved interface electrical properties.
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Keyword: transmission electron microscopy, metal-oxide-semiconductor
Date published: 2025-08-01
Publisher: The Electrochemical Society
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Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI: https://doi.org/10.48505/nims.5628
First published URL: https://doi.org/10.1149/2162-8777/adf3e3
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Updated at: 2025-08-26 11:15:20 +0900
Published on MDR: 2025-08-06 16:18:58 +0900
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