説明:
(abstract)In nanoscale semiconductor devices, electrical conductivity is significantly influenced by inherent disorder. This study examines the electrical transport properties of a single-layer MoS2 field-effect transistor on a few-layered hBN substrate. Temperature-dependent transport measurements reveal that electrical conductivity is predominantly governed by a combination of simple activated and variable-range hopping mechanisms. The calculations on the experimental data yield a localization length around 5 nm for a typical defect density near the Fermi energy as 1014 eV−1 cm−2. Additionally, optoelectronic transport measurements exhibit temperature-dependent persistent photoconductivity, attributed to electron localization within defect states. Calculations based on the temperature-dependent photoconductivity relaxation indicate a localization length of 7 nm, suggesting a direct correlation between the two phenomena.
権利情報:
This document is the Accepted Manuscript version of a Published Article that appeared in final form in ACS Applied Materials & Interfaces, copyright © 2025 American Chemical Society. To access the final published article, see https://doi.org/10.1021/acsami.5c08111.
キーワード: MoS₂ field-effect transistor, Variable-range hopping, Persistent photoconductivity
刊行年月日: 2025-07-25
出版者: American Chemical Society (ACS)
掲載誌:
研究助成金:
原稿種別: 著者最終稿 (Accepted manuscript)
MDR DOI:
公開URL: https://doi.org/10.1021/acsami.5c08111
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更新時刻: 2026-07-27 09:46:50 +0900
MDRでの公開時刻: 2026-07-27 12:27:56 +0900
| ファイル名 | サイズ | |||
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| ファイル名 |
2025A01223G_Role_of_carrier_localization_on_the_optoelectronic_transport_in_single_layer_Mos2__SreemantaMitra_.pdf
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application/pdf |
サイズ | 5.04MB | 詳細 |
| ファイル名 |
2025A01223G_SI_am5c08111_si_001.pdf
application/pdf |
サイズ | 428KB | 詳細 |