Index Catalog // MDR

Skip to Content

Home
About
Help
Contact
Login

Search MDR

Search Constraints

Start Over

Filtering by: Author OGIWARA, Toshiya Remove constraint Author: OGIWARA, Toshiya Keyword HfO2/Si Remove constraint Keyword: HfO2/Si Publisher National Institute for Materials Science Remove constraint Publisher: National Institute for Materials Science

1 - 7 of 7

relevance
date uploaded ▼
date uploaded ▲
date modified ▼
date modified ▲

Number of results to display per page

10 per page
20 per page
50 per page
100 per page

View results as:

List Gallery Masonry Slideshow

Search Results

Raw data files for Fig. 7 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiments

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

21/12/2022

Date Modified:

09/02/2023
Raw data files for Fig. 5 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiment

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

20/04/2023
Raw data files for Fig. 9 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiments

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

29/05/2023

Date Modified:

26/06/2023
Raw data files for Fig. 10 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiments

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

23/06/2023

Date Modified:

18/07/2023
Raw data files for Fig. 11 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiments

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

13/07/2023

Date Modified:

07/08/2023
Raw data files for Fig. 12 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiments

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

07/08/2023
Raw data files for Fig. 6 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam

Resource Type:

Dataset

Data origin:

experiments

Author:

OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki

Date Uploaded:

09/02/2023

Date Modified:

30/03/2024

Limit your search

Type of work

Dataset7

Keyword

Auger depth profiling analysis7
HfO2/Si[remove]7
Ultra low angle incidence ion beam7

Publisher

National Institute for Materials Science[remove]7

Resource type

Dataset7

Visibility

open7

Rights Statement Sim

In Copyright7

Data origin

experiments6
experiment1

Characterization methods

spectroscopy7

Author

NAGATA, Takahiro7
OGIWARA, Toshiya[remove]7
YOSHIKAWA, Hideki7

National Institute for Materials Science

Research Network and Facility Services Division (RNFS)
Materials Data Platform

© 2020–2024 National Institute for Materials Science. Works are available under licenses specified on their pages.

Terms of Use
Privacy Policy
Data Platform DICE
NIMS Digital Library