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Yuichi Oshima
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Applied Physics Express
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Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
Elimination of threading dislocations in α-Ga2O3 by double layered epitaxial lateral o...
Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
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Ga2O3
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HCl gas etching
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dislocation
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English
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IOP Publishing
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Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International
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Yuichi Oshima
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Takayoshi Oshima
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Katsuaki Kawara
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Mitsuru Okigawa
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Takashi Shinohe
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The Murata Science Foundation
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Journal
Applied Physics Express
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