Skip to Content
Toggle navigation
Home
About
Help
Contact
Login
Search MDR
Go
Search Constraints
Start Over
Filtering by:
Author
Yuichi Oshima
Remove constraint Author: Yuichi Oshima
Keyword
Ga2O3
Remove constraint Keyword: Ga2O3
Publisher
AIP Publishing
Remove constraint Publisher: AIP Publishing
1
-
2
of
2
Sort by relevance
relevance
date uploaded ▼
date uploaded ▲
date modified ▼
date modified ▲
Number of results to display per page
10 per page
10
per page
20
per page
50
per page
100
per page
View results as:
List
Gallery
Masonry
Slideshow
Search Results
Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
Description/Abstract:
In this study, we dry etched SiO2-masked (001) b-Ga2O3 substrates in HCl gas flow at a high temperature without plasma excitation. The et...
Keyword:
Ga2O3
,
HCl
, and
etching
Resource Type:
Article
Author:
Takayoshi Oshima
and
Yuichi Oshima
Journal:
APPLIED PHYSICS LETTERS
Date Uploaded:
28/05/2024
Materials issues and devices of α- and β-Ga2O3
Description/Abstract:
パワーデバイスに向けたα- および β- Ga2O3の材料およびデバイス開発の最新状況を概観する。
Keyword:
Ga2O3
,
epitaxy
, and
power device
Resource Type:
Article
Author:
Elaheh Ahmadi
and
Yuichi Oshima
Journal:
JOURNAL OF APPLIED PHYSICS
Date Uploaded:
29/01/2024
Date Modified:
01/02/2024
Toggle facets
Limit your search
Type of work
Publication
2
Keyword
Ga2O3
[remove]
2
HCl
1
epitaxy
1
etching
1
power device
1
Language
English
2
Publisher
AIP Publishing
[remove]
2
Resource type
Article
2
Visibility
open
2
Rights Statement Sim
Creative Commons BY Attribution 4.0 International
1
In Copyright
1
Author
Yuichi Oshima
[remove]
2
Elaheh Ahmadi
1
Takayoshi Oshima
1
Journal
APPLIED PHYSICS LETTERS
1
JOURNAL OF APPLIED PHYSICS
1