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Yuichi Oshima
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Ga2O3
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Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
Materials issues and devices of α- and β-Ga2O3
Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
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Ga2O3
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HCl
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HCl gas etching
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etching
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Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International
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Author
Yuichi Oshima
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Takayoshi Oshima
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Elaheh Ahmadi
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Applied Physics Express
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APPLIED PHYSICS LETTERS
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