Skip to Content
Toggle navigation
Home
About
Help
Contact
Login
Search MDR
Go
Search Constraints
Start Over
Filtering by:
Journal
APPLIED PHYSICS LETTERS
Remove constraint Journal: APPLIED PHYSICS LETTERS
Keyword
HCl
Remove constraint Keyword: HCl
1
entry found
Sort by relevance
relevance
date uploaded ▼
date uploaded ▲
date modified ▼
date modified ▲
Number of results to display per page
10 per page
10
per page
20
per page
50
per page
100
per page
View results as:
List
Gallery
Masonry
Slideshow
Search Results
1.
Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
Description/Abstract:
In this study, we dry etched SiO2-masked (001) b-Ga2O3 substrates in HCl gas flow at a high temperature without plasma excitation. The et...
Keyword:
Ga2O3
,
HCl
, and
etching
Resource Type:
Article
Author:
Takayoshi Oshima
and
Yuichi Oshima
Journal:
APPLIED PHYSICS LETTERS
Date Uploaded:
21/11/2023
Date Modified:
27/11/2023
Toggle facets
Limit your search
Type of work
Publication
1
Keyword
Ga2O3
1
HCl
[remove]
1
etching
1
Language
English
1
Publisher
AIP Publishing
1
Resource type
Article
1
Visibility
open
1
Rights Statement Sim
Creative Commons BY Attribution 4.0 International
1
Author
Takayoshi Oshima
1
Yuichi Oshima
1
Journal
APPLIED PHYSICS LETTERS
[remove]
1