Dataset: Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
Filename: H. Che et al., J. Vac. Sci. Technol. A 44, 030402 (2026).pdf (サムネイル) Download
Content type: application/pdf
Size: 841KB
Checksum: 49fbdb065cece6916693653dd51356c7