High-pressure MOCVD growth of InGaN thick films toward the photovoltaic applications
- Journal article
- Creator
-
Liwen Sang (author) (Search by this author)National Institute for Materials Science
;
Meiyong Liao (author) (Search by this author)National Institute for Materials Science
;
Masatomo Sumiya (author) (Search by this author)National Institute for Materials Science
;
;Xuelin Yang (author) (Search by this author)Bo Shen (author) (Search by this author) - Keyword
- High-pressure, MOCVD, InGaN
- Date published
- 2021-12-01
- Updated at
- 2024-12-17 16:30:45 +0900
Dual-Step Chemical Treatment of Wafer-Scale Metal–Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides
- Journal article
- Creator
-
;Juhwan Lim (author) (Search by this author);Anh Tuấn Hoàng (author) (Search by this author);Zhaojun Li (author) (Search by this author);Tran Thi Ngoc Van (author) (Search by this author);Jung-In Lee (author) (Search by this author);Kihyun Lee (author) (Search by this author);Nicolas Gauriot (author) (Search by this author);Kyle Frohna (author) (Search by this author)Takashi Taniguchi (author) (Search by this author)National Institute for Materials Science
;
Kenji Watanabe (author) (Search by this author)National Institute for Materials Science
;
;Bonggeun Shong (author) (Search by this author);Kwanpyo Kim (author) (Search by this author);Samuel D. Stranks (author) (Search by this author);Jong-Hyun Ahn (author) (Search by this author);Manish Chhowalla (author) (Search by this author)Akshay Rao (author) (Search by this author)
- Keyword
- molybdenum disulfide (MoS2) , MOCVD, chemical treatment
- Date published
- 2025-10-07
- Updated at
- 2026-02-17 08:30:32 +0900