Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
- ジャーナル論文
- 著者
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;Haoming Che (author) (この著者で検索)Takashi Onaya (author) (この著者で検索)
https://orcid.org/0000-0002-2710-8623
(unauthenticated)
National Institute for Materials Science
;
;Atsushi Tamura (author) (この著者で検索);Masaki Ishii (author) (この著者で検索);Hiroshi Taka (author) (この著者で検索)Koji Kita (author) (この著者で検索) - キーワード
- atomic layer deposition, ferroelectric HfO2-based thin films, oxidant, low temperature fabrication process
- 刊行年月日
- 2026-05-01
- 更新時刻
- 2026-07-14 10:27:45 +0900
Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films
- ジャーナル論文
- 著者
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Tohru Tsuruoka (author) (この著者で検索)National Institute for Materials Science
;
Samapika Mallik (author) (この著者で検索)
https://orcid.org/0000-0001-9281-9416
(unauthenticated)
;
;Takuji Tsujita (author) (この著者で検索);Yuu Inatomi (author) (この著者で検索)Kazuya Terabe (author) (この著者で検索)National Institute for Materials Science
- キーワード
- atomic layer deposition, lithium phosphate, lithium phosphorus oxynitride, solid-state electrolyte, plasma reactant
- 刊行年月日
- 2024-06-25
- 更新時刻
- 2025-06-25 08:30:22 +0900