Near-vertical plasma-free HCl gas etching on (011) β-Ga₂O₃

Journal article

Creator

Takayoshi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8550-9735

NIMS Researchers Directory SAMURAI

Takayoshi Oshima ;

Yuichi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8293-4891

NIMS Researchers Directory SAMURAI

Yuichi Oshima

Keyword

Ga2O3, crystallographic etching, (011)

Date published

2025-01-01

Updated at

2026-01-24 15:43:35 +0900