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APEX-107351.docx
Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
Article
Creator
Takayoshi Oshima SAMURAI ORCID ; Yuichi Oshima SAMURAI ORCID
Keyword
Ga2O3, HCl gas etching
Date published
2023-06-01
Updated at
2024-06-15 08:30:13 +0900