Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate

Journal article

Creator

Takayoshi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8550-9735

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Takayoshi Oshima ;

Yuichi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8293-4891

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Yuichi Oshima

Keyword

Ga2O3, HCl gas etching

Date published

2023-06-01

Updated at

2024-06-15 08:30:13 +0900