Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas

Journal article

Creator

Takayoshi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8550-9735

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Takayoshi Oshima ;

Yuichi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8293-4891

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Yuichi Oshima

Keyword

Ga2O3, etching, HCl

Date published

2023-04-17

Updated at

2024-05-29 08:30:12 +0900