Jiuning Hu
(University of Maryland)
;
Albert F. Rigosi
(University of Maryland)
;
Mattias Kruskopf
(University of Maryland)
;
Yanfei Yang
(University of Maryland)
;
Bi-Yi Wu
(University of Maryland)
;
Jifa Tian
(University of Maryland)
;
Alireza R. Panna
(University of Maryland)
;
Hsin-Yen Lee
(University of Maryland)
;
Shamith U. Payagala
(University of Maryland)
;
George R. Jones
(University of Maryland)
;
Marlin E. Kraft
(University of Maryland)
;
Dean G. Jarrett
(University of Maryland)
;
Kenji Watanabe
(Research Center for Functional Materials/Electric and Electronic Materials Field/Electroceramics Group, National Institute for Materials Science
)
;
Takashi Taniguchi
(Research Center for Functional Materials/Exploring Function Field/High Pressure Group, National Institute for Materials Science
)
;
Randolph E. Elmquist
(University of Maryland)
;
David B. Newell
(University of Maryland)
説明:
(abstract)We report the fabrication and measurement of top gated epitaxial graphene p-n junctions where exfoliated hexagonal boron nitride (h-BN) is used as the gate dielectric. The four-terminal longitudinal resistance across a single junction is well quantized at R_(K-90) (25812.807 ohm) with a relative uncertainty of 10^-7. After the exploration of numerous parameter spaces, we summarize that these devices could operate as building blocks in future programmable electrical resistance standards.
権利情報:
キーワード: Epitaxial graphene, p-n junctions, resistance standards
刊行年月日: 2018-10-09
出版者: Springer Science and Business Media LLC
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.1038/s41598-018-33466-z
関連資料:
その他の識別子:
連絡先:
更新時刻: 2025-02-23 22:50:52 +0900
MDRでの公開時刻: 2025-02-23 22:50:52 +0900
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s41598-018-33466-z.pdf
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サイズ | 4.55MB | 詳細 |