Preyaphat Wongchaiya
;
Thi Kim Ngan Nguyen
(National Institute for Materials Science)
;
Pornapa Sujaridworakun
;
Siriporn Larpkiattaworn
;
Tohru S. Suzuki
(National Institute for Materials Science)
;
Tetsuo Uchikoshi
(National Institute for Materials Science)
説明:
(abstract)A low-cost 2D metal-free material based on a graphitic carbon nitride (g-C3N4) film functionalized with a citric acid molecule has been successfully fabricated by Electrophoretic Deposition (EPD) and thermal techniques, aiming to evaluate its suitability for optoelectronic devices. The thickness-controlled g-C3N4 film having a good mechanical property was successfully performed. The chemical stability and photostability of the citric-modified g-C3N4 films deposited on indium tin oxide (ITO) glass were investigated. New chemical links were clarified such that it could possibly become a bridge for enhancing charge transport. The modified samples exhibited a significant increase in their photocurrent response, reaching 25 μA/cm² at a thickness of about 20 μm. Electrochemical impedance spectra (EIS) verified the enhanced conductivity, efficient charge transfer, and reduced electron-hole recombination rate. This research revealed a facile synthetic route and environmentally benign materials, thereby suggesting promising prospects for their application in the optoelectronic field.
権利情報:
キーワード: Graphitic carbon nitride, Citric acid, Electrophoretic deposition, Chemical interaction, Optoelectronic device
刊行年月日: 2024-04-29
出版者: Elsevier BV
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.1016/j.apt.2024.104460
関連資料:
その他の識別子:
連絡先:
更新時刻: 2024-12-18 16:31:09 +0900
MDRでの公開時刻: 2024-12-18 16:31:09 +0900
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Fabrication-of-g-C3N4-films-with-enhanced-mechanical-and-cha_2024_Advanced-P.pdf
application/pdf |
サイズ | 1.86MB | 詳細 |
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1-s2.0-S0921883124001365-mmc1.docx
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application/vnd.openxmlformats-officedocument.wordprocessingml.document |
サイズ | 2.06MB | 詳細 |