論文 Fabrication of g-C3N4 films with enhanced mechanical and charge transfer properties by electrophoretic deposition and subsequent citric acid modification

Preyaphat Wongchaiya ; Thi Kim Ngan Nguyen ORCID (National Institute for Materials Science) ; Pornapa Sujaridworakun ; Siriporn Larpkiattaworn ; Tohru S. Suzuki SAMURAI ORCID (National Institute for Materials Science) ; Tetsuo Uchikoshi SAMURAI ORCID (National Institute for Materials Science)

コレクション

引用
Preyaphat Wongchaiya, Thi Kim Ngan Nguyen, Pornapa Sujaridworakun, Siriporn Larpkiattaworn, Tohru S. Suzuki, Tetsuo Uchikoshi. Fabrication of g-C3N4 films with enhanced mechanical and charge transfer properties by electrophoretic deposition and subsequent citric acid modification. Advanced Powder Technology. 2024, 35 (5), 104460. https://doi.org/10.1016/j.apt.2024.104460
SAMURAI

説明:

(abstract)

A low-cost 2D metal-free material based on a graphitic carbon nitride (g-C3N4) film functionalized with a citric acid molecule has been successfully fabricated by Electrophoretic Deposition (EPD) and thermal techniques, aiming to evaluate its suitability for optoelectronic devices. The thickness-controlled g-C3N4 film having a good mechanical property was successfully performed. The chemical stability and photostability of the citric-modified g-C3N4 films deposited on indium tin oxide (ITO) glass were investigated. New chemical links were clarified such that it could possibly become a bridge for enhancing charge transport. The modified samples exhibited a significant increase in their photocurrent response, reaching 25 μA/cm² at a thickness of about 20 μm. Electrochemical impedance spectra (EIS) verified the enhanced conductivity, efficient charge transfer, and reduced electron-hole recombination rate. This research revealed a facile synthetic route and environmentally benign materials, thereby suggesting promising prospects for their application in the optoelectronic field.

権利情報:

キーワード: Graphitic carbon nitride, Citric acid, Electrophoretic deposition, Chemical interaction, Optoelectronic device

刊行年月日: 2024-04-29

出版者: Elsevier BV

掲載誌:

  • Advanced Powder Technology (ISSN: 09218831) vol. 35 issue. 5 104460

研究助成金:

  • National Institute for Materials Science
  • Institute for the Promotion of Teaching Science and Technology
  • Ministry of Education

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1016/j.apt.2024.104460

関連資料:

その他の識別子:

連絡先:

更新時刻: 2024-12-18 16:31:09 +0900

MDRでの公開時刻: 2024-12-18 16:31:09 +0900

ファイル名 サイズ
ファイル名 Fabrication-of-g-C3N4-films-with-enhanced-mechanical-and-cha_2024_Advanced-P.pdf
application/pdf
サイズ 1.86MB 詳細
ファイル名 1-s2.0-S0921883124001365-mmc1.docx (サムネイル)
application/vnd.openxmlformats-officedocument.wordprocessingml.document
サイズ 2.06MB 詳細