ジャーナル論文 Determining the Electron Scattering from Interfacial Coulomb Scatterers in Two-Dimensional Transistors
Yi-Te Lee (author) (この著者で検索)
;
Yu-Ting Huang (author) (この著者で検索)
;
Shao-Pin Chiu (author) (この著者で検索)
;
Ruey-Tay Wang (author) (この著者で検索)
;
Takashi Taniguchi (author) (この著者で検索)
ORCID SAMURAI ;
Kenji Watanabe (author) (この著者で検索)
ORCID SAMURAI ;
Raman Sankar (author) (この著者で検索)
;
Chi-Te Liang (author) (この著者で検索)
;
Wei-Hua Wang (author) (この著者で検索)
;
Sheng-Shiuan Yeh (author) (この著者で検索)
;
Juhn-Jong Lin (author) (この著者で検索)
コレクション

引用
Yi-Te Lee, Yu-Ting Huang, Shao-Pin Chiu, Ruey-Tay Wang, Takashi Taniguchi, Kenji Watanabe, Raman Sankar, Chi-Te Liang, Wei-Hua Wang, Sheng-Shiuan Yeh, Juhn-Jong Lin. Determining the Electron Scattering from Interfacial Coulomb Scatterers in Two-Dimensional Transistors. ACS Applied Materials & Interfaces. 2024, 16 (1), 1066-1073. https://doi.org/10.1021/acsami.3c14312

説明:

(abstract)

Two-dimensional (2D) transistors are promising for potential applications in next-generation semiconductor chips. Owing to the atomically thin thickness of 2D materials, the carrier scattering from interfacial Coulomb scatterers greatly suppresses the carrier mobility and hampers transistor performance. However, a feasible method to quantitatively determine relevant Coulomb scattering parameters from interfacial long-range scatterers is largely lacking. Here, we demonstrate a method to determine the Coulomb scattering strength and the density of Coulomb scattering centers in InSe transistors by comprehensively analyzing the low-frequency noise and transport characteristics. Moreover, the relative contributions from long-range and short-range scattering in the InSe transistors can be distinguished. This method is employed to make InSe transistors consisting of various interfaces a model system, revealing the profound effects of different scattering sources on transport characteristics and low-frequency noise. Quantitatively accessing the scattering parameters of 2D transistors provides valuable insight into engineering the interfaces of a wide spectrum of ultrathin-body transistors for high-performance electronics.

権利情報:

  • In Copyright

    This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Materials & Interfaces, copyright © 2023 American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsami.3c14312.

キーワード: electron scattering, 2D materials, Coulomb scattering strength, low-frequency noise, indium selenide, interfacial Coulomb scatterers, 2D transist

刊行年月日: 2024-01-10

出版者: American Chemical Society (ACS)

掲載誌:

  • ACS Applied Materials & Interfaces (ISSN: 19448252) vol. 16 issue. 1 p. 1066-1073

研究助成金:

  • Academia Sinica AS-iMATE-109-13
  • Japan Society for the Promotion of Science 20H00354
  • Japan Society for the Promotion of Science 21H05233
  • Japan Society for the Promotion of Science 23H02052
  • National Science and Technology Council 109-2112-M-001-041-MY3
  • National Science and Technology Council 110-2112-M-A49- 033-MY3
  • National Science and Technology Council 110-2112-M001-065-MY3
  • National Science and Technology Council 111-2119- M-007-005
  • National Science and Technology Council 112-2119-M-002-014
  • National Science and Technology Council 110-2112-M-A49-015
  • Ministry of Education, Taiwan
  • World Premier International Research Center Initiative

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5809

公開URL: https://doi.org/10.1021/acsami.3c14312

関連資料:

その他の識別子:

連絡先:

更新時刻: 2025-10-21 15:50:45 +0900

MDRでの公開時刻: 2025-10-21 15:43:32 +0900

ファイル名 サイズ
ファイル名 2024A00062G_Manuscript_Determining the electron scattering from interfacial Coulomb scatterers in two-dimensional transistors.pdf (サムネイル)
application/pdf
サイズ 1.02MB 詳細