Article Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in Ge/Si core–shell nanowires

Yong-Lie Sun ORCID (National Institute for Materials ScienceROR) ; Wipakorn Jevasuwan SAMURAI ORCID (National Institute for Materials ScienceROR) ; Naoki Fukata SAMURAI ORCID (National Institute for Materials ScienceROR)

Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in GeSi core–shell nanowires.pdf
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Yong-Lie Sun, Wipakorn Jevasuwan, Naoki Fukata. Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in Ge/Si core–shell nanowires. Applied Surface Science. 2023, 643 (), 158656. https://doi.org/10.1016/j.apsusc.2023.158656
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(abstract)

トップダウン手法を利用してGeナノワイヤの配列制御と縦型トランジスタチャネル実現のためのGe/Siコアシェルヘテロ接合形成に関する研究成果

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Keyword: Ge nanowire, Nanoimprint lithography, Hole gas, Core–shell

Date published: 2023-10-11

Publisher: Elsevier BV

Journal:

  • Applied Surface Science (ISSN: 01694332) vol. 643 158656

Funding:

  • Japan Society for the Promotion of Science 21J11537
  • Ministry of Education, Culture, Sports, Science and Technology

Manuscript type: Author's version (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.4678

First published URL: https://doi.org/10.1016/j.apsusc.2023.158656

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Updated at: 2025-10-21 15:50:34 +0900

Published on MDR: 2025-10-21 15:45:52 +0900

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