Article Ultrathin CoPt alloy films with fcc (111) orientation and perpendicular magnetic anisotropy fabricated by electrodeposition

Daiki Araki ; Yoshiaki Sonobe ; Yukiko K. Takahashi SAMURAI ORCID ; Takayuki Homma

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Citation
Daiki Araki, Yoshiaki Sonobe, Yukiko K. Takahashi, Takayuki Homma. Ultrathin CoPt alloy films with fcc (111) orientation and perpendicular magnetic anisotropy fabricated by electrodeposition. Electrochemistry Communications. 2025, 176 (), 107938. https://doi.org/10.1016/j.elecom.2025.107938

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(abstract)

In this study, ultrathin CoPt alloy films oriented along face-centered cubic (fcc) (111) with perpendicular magnetic anisotropy (PMA) are fabricated by electrodeposition at room temperature and normal pressure without annealing. By increasing the concentration of Pt ions in the electrolytes, initial nucleation of CoPt becomes fine, forming epitaxial CoPt alloy films oriented along fcc (111) to the film planes with very smooth surfaces (Arithmetic average roughness Ra~0.43 nm). The deposited CoPt films show the lower saturation magnetization (MS~620 emu・cm-3) compared to conventional CoPt films with hexagonal close-packed (hcp) structures. The CoPt film with a thickness of 5 nm exhibits large PMA (anisotropy constant Ku~4.3 Merg・cm-3), coercivity (HC~2.4 kOe), and nucleation field (Hn~2.0 kOe). The fabricated CoPt films contribute to the development of magnetic tunnel junctions with enhanced tunnel magnetoresistance effects and a next-generation magnetic memory with ultrahigh recording density.

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Keyword: electrodeposition, CoPt

Date published: 2025-04-17

Publisher: Elsevier BV

Journal:

  • Electrochemistry Communications (ISSN: 13882481) vol. 176 107938

Funding:

  • Core Research for Evolutional Science and Technology G1026
  • Ministry of Education, Culture, Sports, Science and Technology JPMXS0440500024
  • National Institute for Materials Science
  • Core Research for Evolutional Science and Technology JPMJCR21C1

Manuscript type: Author's version (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5566

First published URL: https://doi.org/10.1016/j.elecom.2025.107938

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Updated at: 2025-07-09 12:30:20 +0900

Published on MDR: 2025-07-09 12:17:16 +0900

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