Keyun Gu
(Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science)
;
Zilong Zhang
(Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science)
;
Wen Zhao
(Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science)
;
Guo Chen
(Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science)
;
Jian Huang
(China University of Geosciences)
;
Satoshi Koizumi
(Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science)
;
Yasuo Koide
(Research Center for Electronic and Optical Materials, National Institute for Materials Science)
;
Meiyong Liao
(Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science)
説明:
(abstract)In this work, we clarify the effect of oxygen terminal surface adsorption characteristic on the resonance behavior of SCD MEMS resonator. We examine the Q factors and resonance frequencies of the SCD MEMS resonators with the defective layer removed in a high vacuum chamber by in-situ heating and cooling. Based on ultrahigh stability of resonance characteristic of SCD resonator at room temperature (RT) and high temperature (from 313 K to 933 K), the Q factors are significantly improved after heating processing. The Q factor of the 80 μm-long cantilever is improved from 1.0x105 to 1.2x105 and the resonance frequency increases, as shown in Fig.1. We clarify that the desorption of the absorbates on the oxygen-terminated diamond surface induces the lower surface energy dissipation and higher Q factor. Hence, appropriate surface treatments are necessary for the development of MEMS devices with low energy dissipation and high sensitivity.
権利情報:
会議: 第85回応用物理学会秋季学術講演会 (2024-09-16 - 2024-09-20)
研究助成金:
原稿種別: 論文以外のデータ
MDR DOI: https://doi.org/10.48505/nims.5419
公開URL:
関連資料:
その他の識別子:
連絡先:
更新時刻: 2025-04-12 08:30:28 +0900
MDRでの公開時刻: 2025-04-11 20:23:04 +0900
| ファイル名 | サイズ | |||
|---|---|---|---|---|
| ファイル名 |
Abstract Oxygen-termination effect R.doc
(サムネイル)
application/msword |
サイズ | 58.5KB | 詳細 |