佐々木 宏和
(古河電気工業株式会社)
;
秋谷 俊太
(古河電気工業株式会社)
;
三原 邦照
(古河電気工業株式会社)
;
大場 洋次郎
(豊橋技術科学大学)
;
大沼 正人
(北海道大学)
;
埋橋 淳
(物質・材料研究機構)
;
大久保 忠勝
(物質・材料研究機構)
Alternative title: Characterization of δNi2Si precipitates in Cu-Ni-Si alloy by small angle x-ray scattering, small angle neutron scattering and atom probe tomography
Description:
(abstract)The strength of Cu-Ni-Si alloy can be improved by finely dispersing a Ni-Si-based compound as a precipitate into the Cu parent phase by heat treatment. In order to investigate the strengthening effect of the precipitate, quantitative evaluation of the size distribution and dispersion state is necessary. In this work, we utilized transmission electron microscopy, small-angle X-ray scattering (SAXS), small-angle neutron scattering (SANS), and atom probe tomography to analyze this Ni-Si precipitated phase. The atom probe tomography results showed two types of the diffusion layers at the interface between the Cu parent phase and the precipitated phases. The alloy contrast variation method based on the difference of SAXS and SANS intensity in absolute units suggests that the δNi2Si precipitates are distorted.
Rights:
Keyword: atom probe tomography, transmission electron microscopy, Corson alloy
Date published:
Publisher: 日本銅学会
Journal:
Funding:
Manuscript type: Author's version (Accepted manuscript)
MDR DOI: https://doi.org/10.48505/nims.4326
First published URL: https://doi.org/10.34562/jic.62.1_85
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Updated at: 2024-01-30 09:51:05 +0900
Published on MDR: 2024-01-30 12:30:14 +0900
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X線・中性子小角散乱法及び3次元アトムプローブ法によるCu-Ni-Si合金中のδNi2Si析出相の解析.pdf
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