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代替タイトル: Characterization of δNi2Si precipitates in Cu-Ni-Si alloy by small angle x-ray scattering, small angle neutron scattering and atom probe tomography

説明:

The strength of Cu-Ni-Si alloy can be improved by finely dispersing a Ni-Si-based compound as a precipitate into the Cu parent phase by heat treatment. In order to investigate the strengthening effect of the precipitate, quantitative evaluation of the size distribution and dispersion state is necessary. In this work, we utilized transmission electron microscopy, small-angle X-ray scattering (SAXS), small-angle neutron scattering (SANS), and atom probe tomography to analyze this Ni-Si precipitated phase. The atom probe tomography results showed two types of the diffusion layers at the interface between the Cu parent phase and the precipitated phases. The alloy contrast variation method based on the difference of SAXS and SANS intensity in absolute units suggests that the δNi2Si precipitates are distorted.

権利情報:

• In Copyright
  

キーワード: atom probe tomography, transmission electron microscopy, Corson alloy

刊行年月日:

出版者: 日本銅学会

掲載誌:

• Journal of Japan Institute of Copper (ISSN: 13477234) vol. 62 issue. 1 p. 85-89

研究助成金:

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.4326

公開URL: https://doi.org/10.34562/jic.62.1_85

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更新時刻: 2024-01-30 09:51:05 +0900

MDRでの公開時刻: 2024-01-30 12:30:14 +0900