論文 Effect of strain-induced defects in GaN channel on two-dimensional carrier transport in AlGaN/GaN heterostructures

Masatomo Sumiya SAMURAI ORCID (National Institute for Materials Science) ; Yasutaka Imanaka SAMURAI ORCID (National Institute for Materials Science) ; Yoshitaka Nakano

コレクション

引用
Masatomo Sumiya, Yasutaka Imanaka, Yoshitaka Nakano. Effect of strain-induced defects in GaN channel on two-dimensional carrier transport in AlGaN/GaN heterostructures. Applied Physics Letters. 2025, 127 (10), 101602. https://doi.org/10.1063/5.0283133

説明:

(abstract)

To improve the mobility of two-dimensional electron gas (2DEG) in an AlGaN/GaN heterostructure grown by metalorganic chemical vapor deposition, we characterized the defect distribution around the interface with and without an AlN interlayer by the steady-state photocapacitance method under controlling the bias voltage and incident photon energy. For samples without the AlN interlayer, the defects in the GaN channel layer near the heterointerface were induced by the strain from the Al1-xGaxN barrier depending on the AlN mol fraction. The density of strain-induced defects was markedly increased near the conduction band minimum to 1×1018 cm-3 peaked at a depth of ~10 nm from the heterointerface for the Al0.24Ga0.76N/GaN sample. The AlN interlayer was confirmed to suppress the formation of strain-induced defects. The carrier mobility evaluated by magneto transport measurements was also improved clearly in samples with the AlN layer because of the reduction in the density of strain-induced defects leading to remote 2DEG scattering. We have clarified the correlation between the density of strain-induced defects and the 2DEG mobility for a comprehensive understanding of the carrier transport in strained heterostructures.

権利情報:

  • In Copyright
    This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Masatomo Sumiya, Yasutaka Imanaka, Yoshitaka Nakano; Effect of strain-induced defects in GaN channel on two-dimensional carrier transport in AlGaN/GaN heterostructures. Appl. Phys. Lett. 8 September 2025; 127 (10): 101602 and may be found at https://doi.org/10.1063/5.0283133.

キーワード: AlGaN/GaN heterostructure, two-dimensional electron gas

刊行年月日: 2025-09-08

出版者: AIP Publishing

掲載誌:

  • Applied Physics Letters (ISSN: 00036951) vol. 127 issue. 10 101602

研究助成金:

  • National Institute for Materials Science

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5767

公開URL: https://doi.org/10.1063/5.0283133

関連資料:

その他の識別子:

連絡先:

更新時刻: 2025-09-17 16:30:34 +0900

MDRでの公開時刻: 2025-09-17 16:19:20 +0900

ファイル名 サイズ
ファイル名 Revised Manuscript2.docx (サムネイル)
application/vnd.openxmlformats-officedocument.wordprocessingml.document
サイズ 1.18MB 詳細
ファイル名 Supplemental data 4.docx
application/vnd.openxmlformats-officedocument.wordprocessingml.document
サイズ 650KB 詳細