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Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2 /Si by the glancing angle ion beam sputtering method at an incident angle...
Keyword:: Auger Depth Profiling Analysis, HfO2/Si, and Ultra Low Angle Incidence Ion Beam
Material/Specimen:: HfO2
Resource Type:: Article
Author:: Ogiwara, Toshiya, Nagata, Takahiro, and Yoshikawa, Hideki
Journal:: Journal of Surface Analysis
Date Uploaded:: 19/08/2021
Date Modified:: 20/08/2021

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