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1. Conduction band caused by oxygen vacancies in aluminum oxide for resistance random access memory

Description/Abstract:: As a next-generation memory, we have developed a rare-metal-free memory using Al oxide with a high-density of oxygen vacancies (Vos). Th...
Keyword:: Crystallographic defects, Electrical properties and parameters, Electronic bandstructure, First-principle calculations, Random access memory, Resistive switching, Thermally stimulated current spectroscopy, Transmission electron microscope, electron energy loss spectroscopy, and semiconductor structures
Resource Type:: Article
Author:: Harada, Yoshitomo, Kido, Giyuu, Hirayama, Taisei, Kato, Seiichi, Nigo, Seisuke, Kubota, Masato, and Kitazawa, Hideaki
Journal:: journal of applied physics
Date Uploaded:: 05/10/2020
Date Modified:: 06/10/2020

1. Conduction band caused by oxygen vacancies in aluminum oxide for resistance random access memory

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