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先端共用施設・技術プラットフォームの展望と課題 − ナノテクノロジープラットフォーム事業をベースとして −
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Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 — Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy —Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
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First-principles calculations of optical constants
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Depth Profiling Analysis of InP/GaInAsP Multilayers by Auger Electron Spectroscopy, Quantitative Evaluation of the Surface Roughness Caused by Ion Sputtering
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Analysis of electron inelastic scattering in solids over wide energy range and its application to surface chemical analysis
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Electron Inelastic Mean Free Paths in Liquid Water for Energies from10 eV to 10 keV
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Calculations and Measurements of Electron Inelastic Mean Free Paths in Solids
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Calculations of Electron Inelastic Mean Free Paths in Solids over the 10 eV to 200 keV Energy Range with the Relativistic Full Penn Algorithm
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Energy Dependence of Electron Stopping Powers in Elemental Solids over the 100 eV to 30 keV Energy Range
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Auger Depth Profile Analysis of GaAs/AIAs Thin Film by Synthesized Spectrum Method Using Non-Negative Least Square Curve Fitting
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Auger Depth Profiling Analyses of InP/GaInAsP Multilayers
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Calculations of electron inelastic mean free paths.VIII. Data for 15 elemental solids over the 50-2000 eV range
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Depth Profiling Analysis of InP/GaInAsP Multilayer Structure with Auger Electron Spectroscopy by Using Argon Ion Spot Beam
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Inelastic Scattering of Electrons in Solids
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