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Filtering by: Author Yoshikawa, Hideki Keyword HfO2/Si Rights Statement Sim In Copyright

English Translation of J. Surf. Anal. 24, 192-205(2018), Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2 /Si by the glancing angle ion beam sputtering method at an incident angle...

Keyword:

Auger Depth Profiling Analysis, HfO2/Si, and Ultra Low Angle Incidence Ion Beam

Material/Specimen:

HfO2

Resource Type:

Article

Author:

Ogiwara, Toshiya, Nagata, Takahiro, and Yoshikawa, Hideki

Journal:

Journal of Surface Analysis

Date Uploaded:

19/08/2021

Date Modified:

20/08/2021
Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger Depth Profiling analysis, HfO2/Si, and Ultra Low Angle Incidence Ion Beam

Material/Specimen:

HfO2

Resource Type:

Article

Author:

Yoshikawa, Hideki, Ogiwara, Toshiya, and Nagata, Takahiro

Journal:

Journal of Surface Analysis

Date Uploaded:

25/05/2021

Date Modified:

26/05/2021