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Filtering by: Author Takayoshi Oshima Remove constraint Author: Takayoshi Oshima Journal APPLIED PHYSICS LETTERS Remove constraint Journal: APPLIED PHYSICS LETTERS Resource type Article Remove constraint Resource type: Article

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Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas

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Type of work

Publication1

Keyword

Ga2O31
HCl1
etching1

Language

English1

Publisher

AIP Publishing1

Resource type

Article[remove]1

Visibility

open1

Rights Statement Sim

Creative Commons BY Attribution 4.0 International1

Author

Takayoshi Oshima[remove]1
Yuichi Oshima1

Journal

APPLIED PHYSICS LETTERS[remove]1

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