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Takayoshi Oshima
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Yuichi Oshima
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Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
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Ga2O3
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HCl
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etching
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English
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AIP Publishing
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Creative Commons BY Attribution 4.0 International
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Author
Takayoshi Oshima
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Yuichi Oshima
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APPLIED PHYSICS LETTERS
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