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Ogiwara, Toshiya
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English Translation of J. Surf. Anal. 24, 192-205(2018), Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam
Description/Abstract:
We have investigated the Auger depth profiling analysis of HfO2 /Si by the glancing angle ion beam sputtering method at an incident angle...
Keyword:
Auger Depth Profiling Analysis
,
HfO2/Si
, and
Ultra Low Angle Incidence Ion Beam
Material/Specimen:
HfO2
Resource Type:
Article
Author:
Ogiwara, Toshiya
,
Nagata, Takahiro
, and
Yoshikawa, Hideki
Journal:
Journal of Surface Analysis
Date Uploaded:
19/08/2021
Date Modified:
20/08/2021
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1
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Auger Depth Profiling Analysis
1
HfO2/Si
1
Ultra Low Angle Incidence Ion Beam
1
Language
English
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1
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Surface Analysis Society of Japan
1
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Article
1
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open
1
Rights Statement Sim
In Copyright
1
Material/Specimen
HfO2
1
Author
Nagata, Takahiro
1
Ogiwara, Toshiya
[remove]
1
Yoshikawa, Hideki
1
Journal
Journal of Surface Analysis
1