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Auger Depth Profiling Analysis of FeNi/CoFeB/FeNi Specimen Using an Ultra Low Angle Incidence Ion Beam

Description/Abstract:

磁気ヘッド材料として用いられているFeNi:5 nm/CoFeB:3 nm/FeNi:10 nm多層薄膜の深さ方向組成分布を調べるために，極低角度入射イオンビームを用いたオージェ深さ方向分析によりイオン加速電圧0.5 kVおよび3.0 kVのスパッタ条件で分析を行った．その...

Keyword:

Auger Depth Profiling Analysis, Ultra Low Angle Incidence Ion Beam, and FeNi/CoFeB/FeNi Thin Film

Material/Specimen:

FeNi/CoFeB/FeNi Thin Film

Resource Type:

Article

Author:

Ogiwara, Toshiya, Yanagiuchi, Katsuaki, and Yoshikawa, Hideki

Journal:

Journal of Surface Analysis

Date Uploaded:

28/05/2021

Date Modified:

04/06/2021
Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam

Description/Abstract:

We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...

Keyword:

Auger Depth Profiling analysis, HfO2/Si, and Ultra Low Angle Incidence Ion Beam

Material/Specimen:

HfO2

Resource Type:

Article

Author:

Yoshikawa, Hideki, Ogiwara, Toshiya, and Nagata, Takahiro

Journal:

Journal of Surface Analysis

Date Uploaded:

25/05/2021

Date Modified:

26/05/2021