Search Constraints
Filtering by:
Author
OGIWARA, Toshiya
Remove constraint Author: OGIWARA, Toshiya
Keyword
HfO2/Si
Remove constraint Keyword: HfO2/Si
Rights Statement Sim
In Copyright
Remove constraint Rights Statement Sim: In Copyright
1 - 8 of 8
Number of results to display per page
Search Results
Select an image to start the slideshow
Raw data files for Fig. 12 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
1 of 8
Raw data files for Fig. 11 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
2 of 8
Raw data files for Fig. 10 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
3 of 8
![](/assets/mdr-default-60f9f544d1af015df85c14718210b56b8525e2b8d87787a1d14789c4e1120191.png)
Raw data files for Fig. 9 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
4 of 8
Raw data files for Fig. 5 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
5 of 8
Raw data files for Fig. 6 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
6 of 8
Raw data files for Fig. 7 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
7 of 8
Raw data files for Fig. 8 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
8 of 8