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Yuichi Oshima
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APPLIED PHYSICS LETTERS
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Progress and challenges in the development of ultra-wide bandgap semiconductor α-Ga2O3 toward realizing power device applications
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Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
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Ga2O3
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Yuichi Oshima
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Elaheh Ahmadi
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Takayoshi Oshima
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APPLIED PHYSICS LETTERS
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