Search Constraints
Search Results
Select an image to start the slideshow
Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
1 of 5
Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
2 of 5
Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
3 of 5
α-Al2O3/Ga2O3 superlattices coherently grown on r-plane sapphire
4 of 5
Fabrication of coherent γ-Al2O3/Ga2O3 superlattices on MgAl2O4 substrates
5 of 5