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Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
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Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
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Atomic position and the chemical state of an active Sn dopant for Sn-doped β-Ga2O3(001)
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Materials issues and devices of α- and β-Ga2O3
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Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
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Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
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α-Al2O3/Ga2O3 superlattices coherently grown on r-plane sapphire
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Fabrication of coherent γ-Al2O3/Ga2O3 superlattices on MgAl2O4 substrates
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