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Yoshikawa, Hideki
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Japanese
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Auger Depth Profiling Analysis of FeNi/CoFeB/FeNi Specimen Using an Ultra Low Angle Incidence Ion Beam
Description/Abstract:
磁気ヘッド材料として用いられているFeNi:5 nm/CoFeB:3 nm/FeNi:10 nm多層薄膜の深さ方向組成分布を調べるために,極低角度入射イオンビームを用いたオージェ深さ方向分析によりイオン加速電圧0.5 kVおよび3.0 kVのスパッタ条件で分析を行った.その...
Keyword:
Auger Depth Profiling Analysis
,
Ultra Low Angle Incidence Ion Beam
, and
FeNi/CoFeB/FeNi Thin Film
Material/Specimen:
FeNi/CoFeB/FeNi Thin Film
Resource Type:
Article
Author:
Ogiwara, Toshiya
,
Yanagiuchi, Katsuaki
, and
Yoshikawa, Hideki
Journal:
Journal of Surface Analysis
Date Uploaded:
28/05/2021
Date Modified:
04/06/2021
Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam
Description/Abstract:
We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:
Auger Depth Profiling analysis
,
HfO2/Si
, and
Ultra Low Angle Incidence Ion Beam
Material/Specimen:
HfO2
Resource Type:
Article
Author:
Yoshikawa, Hideki
,
Ogiwara, Toshiya
, and
Nagata, Takahiro
Journal:
Journal of Surface Analysis
Date Uploaded:
25/05/2021
Date Modified:
26/05/2021
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Ultra Low Angle Incidence Ion Beam
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Auger Depth Profiling Analysis
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Auger Depth Profiling analysis
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FeNi/CoFeB/FeNi Thin Film
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HfO2/Si
1
Language
Japanese
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Surface Analysis Society of Japan
2
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Article
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Material/Specimen
FeNi/CoFeB/FeNi Thin Film
1
HfO2
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Author
Ogiwara, Toshiya
2
Yoshikawa, Hideki
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2
Nagata, Takahiro
1
Yanagiuchi, Katsuaki
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Journal
Journal of Surface Analysis
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