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Takayoshi Oshima
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Yuichi Oshima
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Applied Physics Express
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Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate
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Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
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Ga2O3
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HCl gas etching
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selective area growth
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English
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IOP Publishing
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Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International
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Takayoshi Oshima
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Yuichi Oshima
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The Murata Science Foundation
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Applied Physics Express
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